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Influence of RF Bias on the Deposition of CrN Studied by OES
Author(s) -
Zhang Z. G.,
Rapaud O.,
Bonasso N.,
Mercs D.,
Dong C.,
Coddet C.
Publication year - 2008
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/adem.200800053
Subject(s) - materials science , sputter deposition , substrate (aquarium) , sputtering , chromium nitride , coating , deposition (geology) , chromium , nitride , analytical chemistry (journal) , optoelectronics , cavity magnetron , metallurgy , chemical engineering , thin film , composite material , nanotechnology , layer (electronics) , chemistry , environmental chemistry , paleontology , oceanography , engineering , sediment , geology , biology
Chromium nitride coatings were synthesized by DC magnetron sputtering techniques. Optical emission spectroscopy (OES) was applied to investigate the role of the different level RF substrate biases. The results show that the main chemical reaction process occurred on substrate surface and OES signal ratio I(N 2 )/I(Cr) can be used to predict the composition evolution. Ion bombardment effects were identified, especially in the range from 60 V to 100 V, they provide benefits to make coating denser and improve mechanical properties.