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Morphology and Growth Process of Carbon Films Prepared by Microwave / Radio Frequency Plasma Assisted CVD
Author(s) -
Kaczorowski W.,
Niedzielski P.
Publication year - 2008
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/adem.200800052
Subject(s) - materials science , chemical vapor deposition , microwave , radio frequency , carbon fibers , plasma , deposition (geology) , silicon , carbon film , chemical engineering , homogeneous , nanotechnology , optoelectronics , thin film , composite material , sediment , composite number , computer science , engineering , biology , thermodynamics , telecommunications , paleontology , physics , quantum mechanics
In this work the carbon coatings created by microwave/radio frequency plasma assisted chemical vapour deposition method were investigated. The deposition parameters were optimized in order to obtain homogeneous carbon coatings on such different substrates as AISI 316L steel and silicon. The MW/RF PACVD technique is promising for many different types of applications.