The Optimal Grain Sized Nanocrystalline Ni with High Strength and Good Ductility Fabricated by a Direct Current Electrodeposition | Zendy

Shen X. | Zendy; Lian J. | Zendy; Jiang Z. | Zendy; Jiang Q. | Zendy

Premium

The Optimal Grain Sized Nanocrystalline Ni with High Strength and Good Ductility Fabricated by a Direct Current Electrodeposition

Author(s) -

Shen X.,

Lian J.,

Jiang Z.,

Jiang Q.

Publication year - 2008

Publication title -

advanced engineering materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.938

H-Index - 114

eISSN - 1527-2648

pISSN - 1438-1656

DOI - 10.1002/adem.200800009

Subject(s) - materials science , nanocrystalline material , grain size , annealing (glass) , metallurgy , isotropy , nanometre , texture (cosmology) , direct current , composite material , nanotechnology , optics , physics , image (mathematics) , quantum mechanics , voltage , artificial intelligence , computer science

In this work, six pure Ni specimen which mean grain sizes spans a broad range from ultra‐fine to nanometer were fabricated by direct current electrodeposition and a coarse grain Ni was obtained by annealing. A gradual transition of the crystallographic preferred orientation of the deposited Ni from (200) texture to isotropic or random orientation with decreasing the mean grain size was revealed by XRD.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here

Accelerating Research