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The Optimal Grain Sized Nanocrystalline Ni with High Strength and Good Ductility Fabricated by a Direct Current Electrodeposition
Author(s) -
Shen X.,
Lian J.,
Jiang Z.,
Jiang Q.
Publication year - 2008
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/adem.200800009
Subject(s) - materials science , nanocrystalline material , grain size , annealing (glass) , metallurgy , isotropy , nanometre , texture (cosmology) , direct current , composite material , nanotechnology , optics , physics , image (mathematics) , quantum mechanics , voltage , artificial intelligence , computer science
In this work, six pure Ni specimen which mean grain sizes spans a broad range from ultra‐fine to nanometer were fabricated by direct current electrodeposition and a coarse grain Ni was obtained by annealing. A gradual transition of the crystallographic preferred orientation of the deposited Ni from (200) texture to isotropic or random orientation with decreasing the mean grain size was revealed by XRD.