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Quantitative Model of FIB Deposition
Author(s) -
Rüdenauer F.,
Mozdzen G.,
Costin W.,
Semerad E.
Publication year - 2007
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/adem.200700125
Subject(s) - deposition (geology) , materials science , focused ion beam , tungsten , sputtering , yield (engineering) , beam (structure) , ion beam , flux (metallurgy) , sputter deposition , ion beam deposition , analytical chemistry (journal) , nanotechnology , ion , thin film , composite material , optics , metallurgy , chemistry , physics , environmental chemistry , organic chemistry , biology , paleontology , sediment
A quantitative theory for patterned depositions in focused ion beam (FIB) machines is developed The theory describes local deposition speed in terms of instrumental (beam current, beam diameter, scanning frequency, precursor flux, pattern size, ...) and process parameters (deposition cross section, number of adsorption sites, sputtering yield, ...). The theory is experimentally validated; for the case of deposition of tungsten and platinum numerical values of process parameters are determined from experimental measurements of deposition speed.