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In‐Situ Preparation and Analysis of Functional Oxides
Author(s) -
Ensling D.,
Thißen A.,
Gassenbauer Y.,
Klein A.,
Jaegermann W.
Publication year - 2005
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/adem.200500125
Subject(s) - x ray photoelectron spectroscopy , materials science , stoichiometry , in situ , oxide , electronic structure , interface (matter) , chemical engineering , nanotechnology , chemistry , composite material , metallurgy , computational chemistry , contact angle , organic chemistry , sessile drop technique , engineering
Performance degradation of functional oxide materials and interfaces is – besides structural changes – caused by changes of the chemical composition, the electronic structure and the surface and interface potentials. In‐situ preparation and analysis for LiCoO 2 thin films and for ITO/ZnPc interfaces are presented in this work. Sample stoichiometries, electronic structure and surface and interface potentials with photoelectron spectroscopy are analysed under well defined conditions.