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Electroless Metallization of Dendrimer‐Coated Micropatterns
Author(s) -
Bittner A.M.,
Wu X.C.,
Kern K.
Publication year - 2002
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/1616-3028(20020618)12:6/7<432::aid-adfm432>3.0.co;2-1
Subject(s) - passivation , materials science , dendrimer , amide , metal , microcontact printing , carboxylate , molecule , nanotechnology , wafer , deposition (geology) , silicon , chemical engineering , polymer chemistry , organic chemistry , metallurgy , chemistry , paleontology , layer (electronics) , sediment , engineering , biology
We combined microcontact printing (μCP), the chemical modification of surfaces, and the binding and reduction of metal ions to produce arrays of metal clusters and metal patterns. Pd 2+ was bound in and at polyamine–amide (PAMAM) dendrimer molecules with potential ligands (amides and amines or carboxylate). Pd clusters formed after reduction. They provided chemically well‐defined nuclei for the electroless deposition of metals. After producing a passivation pattern with μCP, deposition occurred only on those pixels or lines that were covered with Pd clusters. The method is quite general, as exemplified by two different passivation examples, alkanethiolate on gold and alkylsilane on oxidized silicon wafers.