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Capillary Force Lithography: Large‐Area Patterning, Self‐Organization, and Anisotropic Dewetting
Author(s) -
Suh K.Y.,
Lee H.H.
Publication year - 2002
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/1616-3028(20020618)12:6/7<405::aid-adfm405>3.0.co;2-1
Subject(s) - dewetting , polydimethylsiloxane , materials science , lithography , capillary action , nanotechnology , polymer , anisotropy , x ray lithography , thin film , resist , optoelectronics , composite material , optics , layer (electronics) , physics
This article gives an overview on a new lithographic technique called capillary force lithography for large‐area patterning. The technique simply involves placing a polydimethylsiloxane mold on a polymer film, which is then heated above the glass‐transition temperature of the polymer. Various useful microstructures can be obtained by sequential applications of the technique through self‐organization. Dewetting, which can be observed in capillary force lithography for relatively thin films, is also described as a new pathway for realizing anisotropic dewetting.