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In‐situ Stress Monitoring with a Laser‐Fibre System
Author(s) -
Barrioz V.,
Irvine S.J.C.,
Jones D.P.
Publication year - 2002
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/1527-2648(20020806)4:8<550::aid-adem550>3.0.co;2-q
Subject(s) - materials science , borosilicate glass , residual stress , substrate (aquarium) , thin film , laser , composite material , stress (linguistics) , evaporation , layer (electronics) , in situ , vacuum evaporation , deposition (geology) , optoelectronics , optics , nanotechnology , linguistics , oceanography , physics , philosophy , meteorology , thermodynamics , geology , paleontology , sediment , biology
A novel laser‐fibre system is used for in‐situ stress monitoring of thin film deposition on a glass substrate. The authors have shown that it could also be used to monitor the temperature of the substrate, as well as the thickness of the growing layer, using the thin film interference equation. Single layers of ZnS and YF 3 optical coatings have been evaporated onto borosilicate glass, doped with cerium oxide, in the environment of a high vacuum (HV) chamber. The results obtained show that the novel laser‐fibre system used as a stress monitor can give insights into the causes of thin film residual stress in vacuum evaporation.