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Diamond Films Synthesized at Ultralow Filament Temperatures
Author(s) -
Zhang G.F.,
Buck V.
Publication year - 2002
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/1527-2648(200203)4:3<131::aid-adem131>3.0.co;2-p
Subject(s) - diamond , protein filament , chemical vapor deposition , materials science , atmospheric temperature range , material properties of diamond , diffraction , phase (matter) , nanotechnology , composite material , chemical engineering , optics , chemistry , thermodynamics , physics , organic chemistry , engineering
In a traditional hot‐filament chemical vapor deposition (HF‐CVD) system, high filament temperature is very necessary and plays an essential role in creating the gas‐phase species that enable and influence diamond growth. In this communication, the authors report of the growth of diamond films using a ultralow filament temperature range of 1300–1700°C. The experimental results have shown that well‐faceted diamond particles can be produced at 1500–1700°C filament temperature. The films deposited at 1300°C filament temperature are still characteristic of diamond by x‐ray diffraction. Moreover, (111) diamond grains deposited at the low filament temperature of 1500°C are dominant.