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Rapid Growth of Hard and Compact Layers of Stoichiometric ZrN by DC Reactive Magnetron Sputtering Pulsed at Low Frequency
Author(s) -
Dauchot J. P.,
Gouttebaron R.,
Wautelet M.,
Hecq M.
Publication year - 2000
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/1527-2648(200012)2:12<824::aid-adem824>3.0.co;2-i
Subject(s) - materials science , stoichiometry , cavity magnetron , sputtering , sputter deposition , pulsed dc , analytical chemistry (journal) , metallurgy , optoelectronics , thin film , nanotechnology , chemistry , chromatography
No abstracts