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The Use of Ozone in Advanced Chip Manufacturing.
Author(s) -
Saito Takayuki,
Sasaki Kenichi,
Ozawa Taku,
Yoda Satoro
Publication year - 2002
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/1522-2454(200206)14:3<174::aid-vipr174>3.0.co;2-z
Subject(s) - wafer , semiconductor industry , ozone , materials science , chemistry , nanotechnology , engineering , organic chemistry , manufacturing engineering
Ozonized Water Generator has been developed for use in semiconductor manufacturing processes. The use of ozonized water produced with this system permits effective wafer cleaning at room temperature. It is this possible to dispense with RCA cleaning that requires high temperatures and highly concentrated chemicals. Ozonized water has a promising application potential not only in the semiconductor industry but also in the liquid crystal display industry.