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Wear and Corrosion protechive coatings of Si‐based compound's for the chemical apparatus construction
Author(s) -
Dresler B.,
Blum T.,
Hoffmann M.
Publication year - 2000
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/1522-2454(200004)12:2<125::aid-vipr125>3.0.co;2-t
Subject(s) - materials science , ceramic , plasma enhanced chemical vapor deposition , thin film , fabrication , amorphous solid , nanotechnology , composite material , chemistry , crystallography , medicine , alternative medicine , pathology
The use of plasma enhanced CVD allows the deposition of thin films with relatively high coating rates at temperatures below 400°C and on substrates with three‐dimensional geometry. In this way it is possible to deposit amorphous ceramic thin films on the basis of silicon on temperatur‐sensitive materials for tribological applications or as corrosion protective coatings to replace ceramic materials which are difficult to process and expensive in fabrication.