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A Photoelectric Method for Analyzing NO‐Induced Apoptosis in Cultured Neuronal Cells
Author(s) -
Zhang Chunyang,
Wei Taotao,
Ma Hui,
Chen Chang,
Xin Wenjuan,
Chen Dieyan
Publication year - 2000
Publication title -
electroanalysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.574
H-Index - 128
eISSN - 1521-4109
pISSN - 1040-0397
DOI - 10.1002/1521-4109(200011)12:17<1414::aid-elan1414>3.0.co;2-2
Subject(s) - apoptosis , photoelectric effect , dna fragmentation , viability assay , biophysics , microbiology and biotechnology , programmed cell death , chemistry , fragmentation (computing) , annexin , anode , depolarization , optoelectronics , materials science , electrode , biology , biochemistry , ecology
A photoelectric method for analyzing NO‐induced apoptosis in cultured neuronal cells is presented. By integrating ITO (a transparent electrode of indium‐tin oxide coated with borosilicate) with a layer of primary rat cerebellar granule cells and a photoelectric‐current‐measuring system, a cytosensor for measuring photoelectric current of neuronal cells was formed. The cells generated an anode photoelectric current under white light (200–800 nm). The amplitude of the photoelectric current was related to the cell number, the light intensity and the cell viability. During neuronal apoptosis, the decrease of the photoelectric current was in accordance with the decrease of the cell viability, the loss of mitochondrial transmembrane potential, and the fragmentation of DNA. This photoelectric method may provide a simple and sensitive way to study electron‐transfer mechanism during NO‐induced neuronal apoptosis.