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Plasma Polymerized Films for Sensor Devices
Author(s) -
Hiratsuka Atsunori,
Karube Isao
Publication year - 2000
Publication title -
electroanalysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.574
H-Index - 128
eISSN - 1521-4109
pISSN - 1040-0397
DOI - 10.1002/1521-4109(200005)12:9<695::aid-elan695>3.0.co;2-4
Subject(s) - miniaturization , microfabrication , microelectronics , materials science , plasma polymerization , surface micromachining , nanotechnology , polymerization , polymer , plasma , thin film , microtechnology , optoelectronics , fabrication , composite material , medicine , alternative medicine , physics , pathology , quantum mechanics
Miniaturization with semiconductor microfabrication or micromachining techniques is one of the main concerns in sensor technologies. For the combination of sensor and microelectronics technology, polymers should be fabricated in a mass‐producible and miniaturization‐conscious manner as an interface. The polymers fabricated in conventional manners could have potential problems, e.g., obtaining thin (<1 µm) and homogeneous films. Plasma‐polymerized films, which are made in a glow discharge or plasma in a vapor phase, offer a new alternative. This review describes the several characteristics, properties, and applications of plasma‐polymerized films in both chemical and biological fields.