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Generation of Chrome Masks with Micrometer‐Scale Features Using Microlens Lithography
Author(s) -
Wu H.,
Odom T.W.,
Whitesides G.M.
Publication year - 2002
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(20020903)14:17<1213::aid-adma1213>3.0.co;2-s
Subject(s) - photoresist , photolithography , photomask , materials science , microlens , lithography , micrometer , optoelectronics , x ray lithography , fabrication , optics , resist , nanotechnology , lens (geology) , layer (electronics) , physics , medicine , alternative medicine , pathology
Periodic patterns with submicrometer features in a photoresist supported on glass have been generated using arrays of microlenses and macroscopic transparency‐film photomasks. The Figure shows a pattern obtained with a mask in the shape of the letter “G”. Deposition of a chromium film, followed by lift‐off, converts the photoresist pattern into a chrome mask for pattern transfer to other substrates by contact photolithography.