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Controlled Fabrication of Large‐Scale Aligned Carbon Nanofiber/Nanotube Patterns by Photolithography
Author(s) -
Huang S.,
Dai L.,
Mau A.W.H.
Publication year - 2002
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(20020816)14:16<1140::aid-adma1140>3.0.co;2-5
Subject(s) - materials science , carbon nanotube , nanotechnology , photoresist , photolithography , carbon nanofiber , photomask , fabrication , nanofiber , calcination , nanotube , catalysis , resist , layer (electronics) , organic chemistry , medicine , chemistry , alternative medicine , pathology
Large‐scale aligned carbon nanofiber/nanotube patterns have been fabricated by a feasible and inexpensive direct photolithography technique using ordinary black‐and‐white film as a photomask. Using a calcination/reduction protocol, transition metal salts in the photoresist are transformed to metallic dots, which act as catalysts for the growth of aligned carbon nanotubes (see Figure) by acetylene pyrolysis.