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Layer‐by‐Layer Self‐Assembly of Reactive Polyelectrolytes for Robust Multilayer Patterning
Author(s) -
Shi F.,
Dong B.,
Qiu D.,
Sun J.,
Wu T.,
Zhang X.
Publication year - 2002
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(20020605)14:11<805::aid-adma805>3.0.co;2-o
Subject(s) - materials science , polyelectrolyte , self assembly , layer (electronics) , polymer , irradiation , layer by layer , chemical engineering , coupling (piping) , cleavage (geology) , photochemistry , nanotechnology , composite material , chemistry , physics , fracture (geology) , nuclear physics , engineering
Robust multilayer patterns have been created via layer‐by‐layer self‐assembly using a photochemical linking process that involves aromatic azo group cleavage and coupling with carbonyl oxygens from an adjacent polymer strand. The patterning is based on the solubility difference of the photoreactive multilayer before and after UV irradiation. The Figure shows an AFM image of a stripe pattern obtained by selective irradiation.