Premium
Towards Plastic Electronics: Patterning Semiconducting Polymers by Nanoimprint Lithography
Author(s) -
Behl M.,
Seekamp J.,
Zankovych S.,
Sotomayor Torres C.M.,
Zentel R.,
Ahopelto J.
Publication year - 2002
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(20020418)14:8<588::aid-adma588>3.0.co;2-k
Subject(s) - nanoimprint lithography , materials science , nanotechnology , polymer , lithography , electronics , nanolithography , optoelectronics , fabrication , composite material , electrical engineering , medicine , alternative medicine , pathology , engineering
The direct patterning of functional semiconducting polymers (see Figure) has been achieved with a nanoimprint lithography technique. The room‐temperature process described is time‐saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated.