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A New Scanning Probe Lithography Scheme with a Novel Metal Resist
Author(s) -
Rolandi M.,
Quate C.F.,
Dai H.
Publication year - 2002
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(20020205)14:3<191::aid-adma191>3.0.co;2-7
Subject(s) - resist , lithography , materials science , nanotechnology , etching (microfabrication) , substrate (aquarium) , photolithography , x ray lithography , nanolithography , optoelectronics , fabrication , medicine , alternative medicine , pathology , oceanography , layer (electronics) , geology
A scanning probe lithography method based on a novel molybdenum thin film resist is presented. The lithography technique takes advantage of the highly selective etching of a metal oxide, MoO 3 , by water, which makes the lithographic process simple, reliable, and compatible with biological systems. The method can be used to fabricate metal nanowires on insulating substrates. The Figure shows 35 nm wide Ti lines formed on a SiO 2 substrate.