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Patterning Mesoscale Gradient Structures with Self‐Assembled Monolayers and Scanning Tunneling Microscopy Based Replacement Lithography
Author(s) -
Fuierer R.R.,
Carroll R.L.,
Feldheim D.L.,
Gorman C.B.
Publication year - 2002
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(20020116)14:2<154::aid-adma154>3.0.co;2-b
Subject(s) - lithography , materials science , monolayer , scanning tunneling microscope , raster scan , nanotechnology , self assembly , optics , optoelectronics , physics
Complex mesostructures showing gradient‐type surface coverage with ω‐substituted alkanthiols can be generated by STM replacement lithography. Variations of the replacement bias, lithographic scan rate, or raster line spacing create the gradient. The Figure (see also front cover) shows an L‐shaped gradient structure where Au(111) is separately thiol‐covered in the corner, and highly covered on both ends.