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Well‐Aligned Boron Nanowire Arrays
Author(s) -
Cao L. M.,
Zhang Z.,
Sun L. L.,
Gao C. X.,
He M.,
Wang Y. Q.,
Li Y. C.,
Zhang X. Y.,
Li G.,
Zhang J.,
Wang W. K.
Publication year - 2001
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(200111)13:22<1701::aid-adma1701>3.0.co;2-q
Subject(s) - materials science , nanowire , boron , sputter deposition , nanotechnology , optoelectronics , sputtering , thin film , chemistry , organic chemistry
Vertically aligned boron nanowires in self‐assembled large‐scale arrays with excellent uniformity and high density have been fabricated using radio‐frequency magnetron sputtering of boron and B 2 O 3 powder onto various substrates. The nanowires thus produced are several tens of micrometers long and 20–80 nm wide, with typically platform‐shaped tips (see Figure for a high‐magnification SEM image).