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Large Area Photonic Crystal Slabs for Visible Light with Waveguiding Defect Structures: Fabrication with Focused Ion Beam Assisted Laser Interference Lithography
Author(s) -
Vogelaar L.,
Nijdam W.,
van Wolferen H. A. G. M.,
de Ridder R. M.,
Segerink F. B.,
Flück E.,
Kuipers L.,
van Hulst N. F.
Publication year - 2001
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(200110)13:20<1551::aid-adma1551>3.0.co;2-v
Subject(s) - materials science , photonic crystal , lithography , interference lithography , optoelectronics , focused ion beam , optics , photolithography , interference (communication) , photonics , slab , laser , maskless lithography , fabrication , visible spectrum , electron beam lithography , yablonovite , photonic integrated circuit , resist , ion , nanotechnology , channel (broadcasting) , alternative medicine , geophysics , pathology , layer (electronics) , quantum mechanics , medicine , physics , geology , engineering , electrical engineering
Extended photonic crystal slabs with light‐guiding defects have been created by a combination of laser interference lithography (LIL) and local focused ion beam (FIB) assisted deposition. Large area, highly uniform photonic crystal slabs for visible light are thus made possible. The Figure shows a freestanding Si 3 N 4 –air photonic crystal with a light‐guiding defect line running along the center of the slab (total length = 1 mm).