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Capillary Force Lithography
Author(s) -
Suh K. Y.,
Kim Y. S.,
Lee H. H.
Publication year - 2001
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(200109)13:18<1386::aid-adma1386>3.0.co;2-x
Subject(s) - microcontact printing , lithography , materials science , capillary action , replication (statistics) , nanotechnology , next generation lithography , multiple patterning , soft lithography , photolithography , polymer , pdms stamp , resist , optoelectronics , electron beam lithography , composite material , fabrication , medicine , statistics , alternative medicine , mathematics , layer (electronics) , pathology
A simple yet robust method for large‐area patterning of polymer films —capillary force lithography—is presented here. This method, which combines the essential features of imprint lithography and microcontact printing, allows the replication of features down to 100 nm. The Figure shows a typical pattern.