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Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography
Author(s) -
Cheng J. Y.,
Ross C. A.,
Chan V. Z.H.,
Thomas E. L.,
Lammertink R. G. H.,
Vancso G. J.
Publication year - 2001
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(200108)13:15<1174::aid-adma1174>3.0.co;2-q
Subject(s) - copolymer , materials science , lithography , polystyrene , wafer , etching (microfabrication) , cobalt , patterned media , particle (ecology) , nanotechnology , self assembly , optoelectronics , polymer , composite material , metallurgy , grain size , oceanography , layer (electronics) , geology
Single‐domain cobalt dot arrays with high magnetic particle density, patterned over large areas (e.g., 10 cm diameter wafers) are fabricated by self‐assembled block copolymer lithography, using a polystyrene–poly(ferrocenyldimethylsilane) copolymer as a template. By varying the copolymer type and etching conditions the magnetic properties can be tuned. The Figure shows a typical array of Co dots with tungsten caps obtained via this procedure.