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Shallow Nanoporous Surface Layers Produced by Helium Ion Implantation
Author(s) -
Johnson P. B.,
Markwitz A.,
Gilberd P. W.
Publication year - 2001
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(200107)13:12/13<997::aid-adma997>3.0.co;2-k
Subject(s) - nanoporous , materials science , helium , nanoscopic scale , ion implantation , bubble , nanotechnology , metal , chemical engineering , ion , metallurgy , atomic physics , physics , quantum mechanics , parallel computing , computer science , engineering
Abstract High‐dose helium implantation of metals can result in the formation of nanoporous bubble structures with striking features. These structures, which may be a universal response for all metals implanted under appropriate conditions, show considerable promise for applications such as catalysis. They are characterized by nanoscale cavities of uniform size, a high degree of swelling and extremely thin metal walls (∼1 nm in thickness) separating nearest neighbor cavities. The internal surface area associated with the cavities is high and the method of production offers the potential for controlling pore size through the selection of implant parameters.