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Thin‐Film Amorphous Silicon Position‐Sensitive Detectors
Author(s) -
Henry J.,
Livingstone J.
Publication year - 2001
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(200107)13:12/13<1022::aid-adma1023>3.0.co;2-i
Subject(s) - materials science , amorphous silicon , fabrication , detector , optoelectronics , silicon , amorphous solid , thin film , sputtering , thin film transistor , nanotechnology , optics , crystalline silicon , crystallography , medicine , chemistry , alternative medicine , physics , pathology , layer (electronics)
Optical position‐sensitive detectors are a useful class of sensor with a wide range of applications in machine control systems, industrial alignment, and robotic vision. They have distinct advantages over most arrayed discrete optical devices in that they can produce continuous optical signals, and versions based on thin‐film amorphous silicon are not restricted by crystal growth limits and so have the potential to be fabricated in large area format. Sputter‐deposited hydrogenated a‐Si also has features such as excellent adhesion to glass substrates, precise film thickness, and hydrogen content control, which are of some interest in device design and fabrication.