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Chemical Nanolithography with Electron Beams
Author(s) -
Gölzhäuser A.,
Eck W.,
Geyer W.,
Stadler V.,
Weimann T.,
Hinze P.,
Grunze M.
Publication year - 2001
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(200106)13:11<803::aid-adma806>3.0.co;2-w
Subject(s) - nanolithography , materials science , monolayer , cathode ray , nanotechnology , dip pen nanolithography , electron beam lithography , self assembled monolayer , feature (linguistics) , electron , resist , layer (electronics) , fabrication , physics , medicine , alternative medicine , pathology , quantum mechanics , linguistics , philosophy
A highly focused electron beam as the agent for spatially selective reduction of nitro groups to amino groups in a self‐assembled monolayer of aromatics is the key feature of a novel technique in chemical nanolithography presented here. Treatment of the reactive amino groups with different reactants after each e‐beam writing step yields a surface with a defined array of chemically diverse structures; for example, see the line pattern in the Figure.