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Epitaxial Growth of High Dielectric Contrast Three‐Dimensional Photonic Crystals
Author(s) -
Braun P. V.,
Zehner R. W.,
White C. A.,
Weldon M. K.,
Kloc C.,
Patel S. S.,
Wiltzius P.
Publication year - 2001
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(200105)13:10<721::aid-adma721>3.0.co;2-a
Subject(s) - materials science , colloidal crystal , photonic crystal , refractive index contrast , epitaxy , substrate (aquarium) , optoelectronics , dielectric , colloid , crystal growth , nanotechnology , silicon , high contrast , refractive index , photonics , contrast (vision) , optics , crystallography , chemical engineering , fabrication , geology , medicine , oceanography , alternative medicine , chemistry , pathology , layer (electronics) , physics , engineering
The facile creation of oriented single crystal colloidal assemblies directly on a silicon substrate and conversion to a high refractive index contrast photonic crystal is reported here. The route unveiled has great potential for applications in optoelectronics. The Figure displays the sharp boundary between colloidal crystal growth on patterned substrates and random colloidal assembly formation on unpatterned substrates.