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Ultraflat Nanosphere Lithography: A New Method to Fabricate Flat Nanostructures
Author(s) -
Frey W.,
Woods C. K.,
Chilkoti A.
Publication year - 2000
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(200010)12:20<1515::aid-adma1515>3.0.co;2-j
Subject(s) - nanosphere lithography , materials science , nanotechnology , lithography , nanostructure , matrix (chemical analysis) , optoelectronics , fabrication , composite material , medicine , alternative medicine , pathology
Ultraflat nanopatterned surfaces can be created by combining the techniques of nanosphere lithography and ultraflat template stripping, as highlighted here. In this new method—ultraflat nanosphere lithography (UNSL)—nanostructures of one material are embedded in a matrix of a second material (see Figure). The feasibility of UNSL is demonstrated for several pairs of materials.