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A Soft Lithography Approach to the Fabrication of Nanostructures of Single Crystalline Silicon with Well‐Defined Dimensions and Shapes
Author(s) -
Yin Y.,
Gates B.,
Xia Y.
Publication year - 2000
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(200010)12:19<1426::aid-adma1426>3.0.co;2-b
Subject(s) - materials science , fabrication , silicon , lithography , nanotechnology , nanorod , nanowire , micrometer , silicon nanowires , soft lithography , nanostructure , nanolithography , optoelectronics , optics , medicine , alternative medicine , pathology , physics
Silicon nanostructures with well defined shapes and tightly controlled dimensions can be fabricated in relatively large quantities using the soft lithography approach described here. The capability and feasibility of this method are demonstrated by the fabrication of silicon nanowires, nanorods, micrometer‐sized rings (see Figure), and connected triangles (see also inside front cover).