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Preferential Self‐Assembly of Surface‐Modified Si/SiO x Nanoparticles on UV/Ozone Micropatterned Poly(dimethylsiloxane) Films
Author(s) -
PhelyBobin T. S.,
Muisener R. J.,
Koberstein J. T.,
Papadimitrakopoulos F.
Publication year - 2000
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(200009)12:17<1257::aid-adma1257>3.0.co;2-7
Subject(s) - materials science , nanoparticle , raman spectroscopy , nanotechnology , adsorption , ozone , high refractive index polymer , chemical engineering , optics , layer (electronics) , organic chemistry , chemistry , physics , engineering
The specific self‐assembly of Si/SiO xcore–shell nanoparticles onto UV/ozone micropatterned poly(dimethylsiloxane) (PDMS) films is reported here. Auger and Raman spectroscopic mapping document the preferential Si/SiO x nanoparticle adsorption within PDMS domains (see Figure). These nanoparticles display a high refractive index, which renders them potentially important for photonic bandgap applications.