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Photocalcination of Mesoporous Silica Films Using Vacuum Ultraviolet Light
Author(s) -
Hozumi A.,
Yokogawa Y.,
Kameyama T.,
Hiraku K.,
Sugimura H.,
Takai O.,
Okido M.
Publication year - 2000
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/1521-4095(200006)12:13<985::aid-adma985>3.0.co;2-#
Subject(s) - materials science , mesoporous silica , mesoporous material , vacuum ultraviolet , ultraviolet , nanotechnology , mesoporous organosilica , ultraviolet light , chemical engineering , optoelectronics , optics , organic chemistry , catalysis , chemistry , physics , engineering
Supramolecular assemblies of surfactant molecules are often used to synthesize mesoporous silica (MPS). However, elimination of the surfactant molecules by conventional thermocalcination after MPS film synthesis often leads to film distortion or breakage. Here the effective removal of surfactant molecules at room temperature is described in which the hexagonal mesostructure of the film is preserved. The technique used—photocalcination—is based on the photochemical decomposition of organic molecules under irradiation with vacuum ultraviolet light.