Premium
X‐ray High‐Resolution Diffractometry for Studies of Diffuse Scattering in Semiconductor Materials
Author(s) -
Gronkowski J.,
Borowski J.
Publication year - 2001
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/1521-4079(200110)36:8/10<815::aid-crat815>3.0.co;2-n
Subject(s) - semiconductor , scattering , fourier transform , coherence (philosophical gambling strategy) , resolution (logic) , x ray , materials science , high resolution , optics , cluster (spacecraft) , small angle x ray scattering , correlation function (quantum field theory) , physics , condensed matter physics , optoelectronics , quantum mechanics , remote sensing , artificial intelligence , computer science , dielectric , programming language , geology
Older and newest articles on X‐ray diffuse scattering are reviewed and the perspectives of further high‐resolution diffractometry studies for specific semiconductor materials are demonstrated. The importance of correlations of spatial distributions of microdefects as well as correlation functions of the incident beam (partial‐coherence phenomena) is stressed. Other problems include the cluster expansion and Fourier transforms of these correlation functions which should improve the agreement between the simulated and experimental results.