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Local Melting of the NiAl Substrate Under Deposited Pd Clusters During Irradiation in a Transmission Electron Microscope
Author(s) -
Nepijko S.A.,
Klimenkov M.,
Kuhlenbeck H.,
Freund H.J.
Publication year - 2000
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/1521-4079(200007)35:6/7<745::aid-crat745>3.0.co;2-f
Subject(s) - nial , faceting , transmission electron microscopy , materials science , substrate (aquarium) , nanometre , electron microscope , irradiation , cathode ray , electron beam processing , range (aeronautics) , optics , crystallography , molecular physics , chemical physics , electron , nanotechnology , chemistry , intermetallic , composite material , physics , oceanography , alloy , quantum mechanics , geology , nuclear physics
The holes with diameters in the nanometer range was created in the Al 2 O 3 /NiAl(110) substrate if metal clusters deposited on it are irradiated by the intense convergent electron beam in a transmission electron microscope. The localisation and size of holes can be controlled to some extent. The formation of holes can be interrupted by lowering the beam intensity below a critical value. It can be continued by increasing the intensity above the threshold value. We have also disclosed the necessity of clusters' presence on the surface for the start of holes' formation. It was shown earlier that holes thus created are characterized the perfect crystallographic faceting. The method for producing a single nanohole has been described in the present paper.image processing.