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Influence of the H 2 and Ar on the Neon
Author(s) -
Baltog A.,
Raiciu E.,
Musa G.
Publication year - 2000
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/1521-3986(200009)40:5/6<537::aid-ctpp537>3.0.co;2-5
Subject(s) - neon , atomic physics , hydrogen , dielectric barrier discharge , ion , materials science , dissociative recombination , penning ionization , glow discharge , physics , plasma , recombination , argon , dielectric , chemistry , ionization , optoelectronics , nuclear physics , biochemistry , quantum mechanics , gene
The experimental results concerning the influence o the H 2 and Ar addition to the Ne+1% Xe Penning mixture on the neon optical emission are obtained or two types o discharges: a narrow gap dielectric barrier discharge and the negative glow o a d.c. luminescent discharge. The H 2 and Ar contribution to the depletion o the lower level 1s 2 through the Penning collisions and also the hydrogen participation to the feeding of the upper level 2p 1 of the optical transition 2p 1 ‐ 1s 2 of the neon have been demonstrated. As a possible explanation or feeding of the upper level 2p 1 we are favouring the reactive and/or dissociative recombination processes.