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In Situ Optical Techniques for Monitoring the Formation of Nanostructures
Author(s) -
Hingerl K.,
Bonanni A.,
Balderas R.,
Stifter D.
Publication year - 2002
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/1521-3951(200207)232:1<13::aid-pssb13>3.0.co;2-g
Subject(s) - nanostructure , in situ , materials science , epitaxy , spectroscopy , anisotropy , deposition (geology) , nanotechnology , ellipsometry , layer (electronics) , analytical chemistry (journal) , chemical engineering , thin film , optoelectronics , optics , chemistry , paleontology , physics , organic chemistry , engineering , quantum mechanics , chromatography , sediment , biology
Various optical techniques have been developed to meet new challenges in epitaxial growth. The primary parameters needed for growth control, layer thicknesses, and composition strongly influence the formation of nanostructures on surfaces. These two parameters can be obtained with spectroscopic ellipsometry. In this article, we discuss a similiar technique, reflectance difference/anisotropy spectroscopy, which is capable of monitoring in situ the surface stress occuring from surface reconstructions, e.g. dimerization. Using reflectance difference spectroscopy in situ the size and shape of epitaxially grown self‐assembling Mn‐based nanostructures was reproducibly achieved by tracing the formation process. A variety of well controlled strain‐induced island morphologies was obtained with the deposition of semiconducting materials on different Mn surfaces.