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Photosensitive Polyarylates Based on Reaction Development Patterning
Author(s) -
Oyama Toshiyuki,
Kitamura Akira,
Fukushima Takafumi,
Iijima Takao,
Tomoi Masao
Publication year - 2002
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/1521-3927(20020101)23:2<104::aid-marc104>3.0.co;2-8
Subject(s) - scanning electron microscope , materials science , foil method , photoresist , coating , chemical engineering , polymer , irradiation , ethanolamine , polystyrene , nanotechnology , optics , polymer chemistry , composite material , layer (electronics) , chemistry , organic chemistry , physics , nuclear physics , engineering
Films of a commercially available polyarylate (U polymer®) containing a photosensitive agent were prepared by means of spin‐coating onto copper foil, which showed positive‐tone behavior after UV irradiation and development with an ethanolamine/ N ‐methylpyrrolidone/H 2 O mixture. Scanning electron microscope photographs of the images exhibited fine patterns (≈10 μm line/space resolution) with 9–14 μm film thickness. The pattern‐forming mechanism is based on the reaction development patterning (RDP) process, where the main pattern‐forming reaction occurs during development.