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Photochemical Crosslinking and Enzymatic Degradation of Poly(3‐hydroxyalkanoate)s for Micropatterning in Photolithography
Author(s) -
Kim Sang Nyon,
Shim Sang Chul,
Kim Do Young,
Rhee Young Ha,
Kim Young Baek
Publication year - 2001
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/1521-3927(20010901)22:13<1066::aid-marc1066>3.0.co;2-m
Subject(s) - micropatterning , wafer , degradation (telecommunications) , photolithography , materials science , irradiation , oxide , polymer , chemical engineering , prepolymer , silicon , hydrolytic degradation , polymer chemistry , chemistry , nanotechnology , photochemistry , composite material , optoelectronics , polyurethane , computer science , telecommunications , physics , nuclear physics , engineering , metallurgy
Biodegradable poly(3‐hydroxyundecenoate) (PHU) films on silicon wafers were crosslinked with UV light under patterned masks. The films were crosslinked most efficiently when irradiated in the presence of diphenyl(2,4,6‐trimethylbenzoylphosphane oxide) as the initiator. Crosslinked patterns were developed with depolymerase solution because crosslinked PHU was degraded much more slowly than natural PHU. Patterned images with thicknesses of as low as 2.5 μm were obtained showing the potential application of PHU in microlithography as a photosensitive material, which is friendly to the environment.