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Poly[( cis ‐3‐(ethanesulfonyloxy)‐2‐pinanyl methacrylate)‐ co ‐( tert ‐butyl methacrylate)] as an acid‐amplifying photoresist
Author(s) -
Park SangWook,
Arimitsu Koji,
Ichimura Kunihiro
Publication year - 2000
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/1521-3927(20001001)21:15<1050::aid-marc1050>3.0.co;2-v
Subject(s) - comonomer , photoresist , methacrylate , sulfonic acid , copolymer , polymer chemistry , side chain , polymer , materials science , methacrylic acid , chemistry , organic chemistry , layer (electronics)
Synthesis and characteristics of novel copolymers bearing both acid amplifier and acid‐sensitive units are described. The acid amplifier units in the polymer side chains were acidolytically transformed to sulfonic acid residues, leading to the deprotection of the acid‐labile tert ‐butyl ester side chains introduced as a comonomer unit. The copolymer was 3.2 times more sensitive than poly( tert ‐butyl methacrylate) in the presence of a photoacid generator and, therefore, provides practical applicability for photoimaging.