Premium
Micromachining of crosslinked PTFE by direct photo‐etching using synchrotron radiation
Author(s) -
Yamaguchi Daichi,
Katoh Takanori,
Sato Yasunori,
Ikeda Shigetoshi,
Hirose Masaoki,
Aoki Yasushi,
Iida Minoru,
Oshima Akihiro,
Tabata Yoneho,
Washio Masakazu
Publication year - 2002
Publication title -
macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 1022-1360
DOI - 10.1002/1521-3900(200205)181:1<201::aid-masy201>3.0.co;2-m
Subject(s) - materials science , etching (microfabrication) , synchrotron radiation , polytetrafluoroethylene , crystallinity , surface micromachining , irradiation , synchrotron , isotropic etching , fourier transform infrared spectroscopy , dry etching , analytical chemistry (journal) , composite material , optics , chemistry , fabrication , medicine , physics , alternative medicine , layer (electronics) , pathology , nuclear physics , chromatography
Micromachining of crosslinked PTFE (polytetrafluoroethylene) using synchrotron radiation direct photo‐etching method has been demonstrated. High aspect‐ratio microfabrication was carried out. The etching rate of crosslinked PTFE was higher than that of non‐crosslinked PTFE. Through the etching rate measurements of various samples, it was found that synchrotron radiation etching rate of crosslinked PTFE only depends on the degree of crosslinking, neither molecular weight nor crystallinity. The effect of molecular motion on etching process was discussed from temperature dependence data on etching rate. Furthermore, the surface region of synchrotron radiation irradiated sample was investigated by Fourier transform infrared spectroscopy and the experimental result showed that the modification induced by synchrotron radiation proceeded before desorption.