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Optically Tuning the Rate of Stoichiometry Changes: Surface‐Controlled Oxygen Incorporation into Oxides under UV Irradiation
Author(s) -
Merkle Rotraut,
De Souza Roger A.,
Maier Joachim
Publication year - 2001
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/1521-3773(20010601)40:11<2126::aid-anie2126>3.0.co;2-k
Subject(s) - stoichiometry , irradiation , oxygen , materials science , surface modification , chemical engineering , photochemistry , chemistry , organic chemistry , nuclear physics , engineering , physics
UV irradiation was found to accelerate the rate of gas incorporation into wide‐bandgap ionic crystals and thus the rate of stoichiometry change. Up to now, this could only be achieved by changing the temperature, the dopant concentration, or adding catalytic coatings. The stoichiometry strongly affects the electrical conductivity of the crystal. The investigation of this effect provides valuable information on the mechanism of the surface reaction as well as offering new possible applications.