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A simple experimental technique to obtain an optimum antireflection coating in semiconductor optical amplifiers
Author(s) -
Soto H.,
García E.,
Marquez H.,
Valles N.
Publication year - 2000
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/1098-2760(20001120)27:4<223::aid-mop1>3.0.co;2-r
Subject(s) - materials science , simple (philosophy) , semiconductor , optical amplifier , optoelectronics , amplifier , coating , electronic engineering , optics , engineering , nanotechnology , physics , cmos , laser , philosophy , epistemology
Abstract An efficient control technique that allows obtaining coatings with optimal thickness, i.e., minimal residual reflectivities on the semiconductor laser amplifiers facets, is described. The technique consists of completing the antireflection coating evaporation on the laser facets when the ripple on the amplified spontaneous emission spectrum presents the possible lowest value. © 2000 John Wiley & Sons, Inc. Microwave Opt Technol Lett 27: 223–225, 2000.