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Decomposition of ethoxyethane in the cold plasma environment
Author(s) -
Liao WeiTung,
Lee WenJhy,
Chen ChuhYung,
Hsieh LienTe,
Lai ChingCheng
Publication year - 2000
Publication title -
journal of chemical technology and biotechnology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.64
H-Index - 117
eISSN - 1097-4660
pISSN - 0268-2575
DOI - 10.1002/1097-4660(200009)75:9<817::aid-jctb286>3.0.co;2-0
Subject(s) - decomposition , plasma , analytical chemistry (journal) , fourier transform infrared spectroscopy , chemistry , glow discharge , volumetric flow rate , mole fraction , fraction (chemistry) , environmental chemistry , organic chemistry , thermodynamics , optics , physics , quantum mechanics
A radio frequency (RF) plasma system was used to decompose the ethoxyethane (EOE) contained gas. The reactants and final products were analyzed by using an FTIR (Fourier Transform Infrared) spectrometer. The effects of plasma operational parameters, including input power wattage ( W ), equivalence ratios (Φ), feeding concentration ( C ) of EOE and total gas flow rate ( Q ) for EOE decomposition were evaluated. In addition, the possible reaction pathways for EOE decomposition and the formation of final products were built up and are discussed in this paper. The mole fraction profiles of C 2 H 5 OC 2 H 5 , CH 3 CHO, CH 4 , C 2 H 6 , C 2 H 4 , C 2 H 2 , CO 2 and CO were detected and are also presented in this paper. At lower input power wattages, the creation of glow discharge is strongly dependent on the plasma production index ( PPI ). When input power wattages are smaller than 30 W, the minimum values of PPI to create glow discharge ranged between 18.2 and 19.0. The results of this study revealed that, in the RF plasma reactor, the decomposition fraction of EOE could reach 100% under most operational conditions. © 2000 Society of Chemical Industry