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Study on the chemical stability of benzoxazine‐based phenolic resins in carboxylic acids
Author(s) -
Kim HoDong,
Ishida Hatsuo
Publication year - 2000
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/1097-4628(20010214)79:7<1207::aid-app80>3.0.co;2-3
Subject(s) - carboxylic acid , bisphenol a , chemical stability , polymer chemistry , primary (astronomy) , thermal stability , mannich reaction , mannich base , chemical structure , chemistry , base (topology) , bisphenol , organic chemistry , materials science , epoxy , catalysis , mathematics , mathematical analysis , physics , astronomy
The chemical stability of typical polybenzoxazines based on bisphenol‐A and primary amines was studied. Using proton nuclear magnetic resonance spectroscopic analysis of polybenzoxazine model dimers, it was found that the Mannich base is stable in a carboxylic acid solution. It is proposed that the nature of the primary amines is responsible for the interactions which take place between the carboxylic acid and the Mannich‐base model dimers. As a result, the chemical stability of polybenzoxazines may also be related to the nature of the amines, which, in turn, influence the strength of the hydrogen‐bonded network structure which develops upon cure. © 2000 John Wiley & Sons, Inc. J Appl Polym Sci 79: 1207–1219, 2001