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Evaluation of halogenated polyimide etching for optical waveguide fabrication by using inductively coupled plasma
Author(s) -
Han Kwansoo,
Kim Junghee,
Jang WooHyuk
Publication year - 2000
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/1097-4628(20010103)79:1<176::aid-app200>3.0.co;2-7
Subject(s) - inductively coupled plasma , etching (microfabrication) , materials science , fabrication , polyimide , reactive ion etching , volumetric flow rate , rf power amplifier , torr , plasma etching , analytical chemistry (journal) , plasma , chamber pressure , optoelectronics , layer (electronics) , chemistry , nanotechnology , chromatography , medicine , amplifier , physics , alternative medicine , cmos , quantum mechanics , pathology , metallurgy , thermodynamics
Oxygen plasma etching of a series of halogenated polyimides was carried out for low‐loss waveguide fabrication by using inductively coupled plasma (ICP). The effects of etching parameters such as ICP power, rf power, and O 2 flow rate on the etching rate and etching profile of polymer films were investigated. The increase in the etch rate with the ICP power and the rf power was observed. Both the vertical profile and sidewall roughness were found to be related to the ion energy (dc bias). By optimizing these parameters, a vertical profile and a smooth sidewall were obtained by 500 W of ICP power, 150 W of rf power, 5 mTorr of chamber pressure, and 40 sccm of the O 2 flow rate. © 2000 John Wiley & Sons, Inc. J Appl Polym Sci 79: 176–182, 2001