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An in situ method for measuring acid loss from polymer films
Author(s) -
Coenjarts Chris,
Cameron Jim,
Pohlers Gerd,
Scaiano J. C.,
Zampini Anthony
Publication year - 2000
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/1097-4628(20001209)78:11<1897::aid-app70>3.0.co;2-w
Subject(s) - polymer , polymer chemistry , materials science , absorption (acoustics) , kinetics , acrylate , thin film , deprotonation , acrylate polymer , chemical engineering , chemistry , organic chemistry , copolymer , composite material , nanotechnology , engineering , ion , physics , quantum mechanics
This article reports an in situ approach to studying acid loss from polymer (films of the type used in microlithiography. We developed a method which makes use of the dye coumarin 6 (C6) which has absorption characteristics which change dramatically as a result of acid‐induced changes in its prototropic forms. Acid loss from polymer films containing C6 is accompanied by its deprotonation, which is signaled by a change in the absorption of the film. This technique provides kinetic data describing acid loss from polymer films. Acid loss is a function of both acid volatilization from sites at the surface of the film as well as diffusional processes within the film. Under controlled conditions, acid loss obeys first‐order kinetics, and the half‐lives, τ 1/2 , of acids in phenolic and acrylate polymer films were determined. We studied the effects of temperature, acid structure, polymer structure, and T g on the τ 1/2 values obtained. © 2000 John Wiley & Sons, Inc. J Appl Polym Sci 78: 1897–1905, 2000