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A systematic database of thin‐film measurements by EPMA Part II—Palladium films
Author(s) -
Bastin G. F.,
Heijligers H. J. M.
Publication year - 2000
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/1097-4539(200009/10)29:5<373::aid-xrs442>3.0.co;2-s
Subject(s) - electron microprobe , thin film , aluminium , palladium , substrate (aquarium) , materials science , relative standard deviation , root mean square , analytical chemistry (journal) , database , metallurgy , chemistry , mathematics , computer science , statistics , nanotechnology , electrical engineering , engineering , geology , biochemistry , oceanography , chromatography , detection limit , catalysis
In succession to our work on aluminium films a systematic database of thin‐film measurements on palladium films by electron probe microanalysis is presented. This time the measurements were performed at accelerating voltages between 4 and 30 kV, again on films of six different nominal thicknesses, ranging from 100 to 3200 Å, which were deposited simultaneously on 20 different substrates, ranging between Be and Bi. The purpose of this work was to provide further systematic data on which thin‐film programs can be tested. A total of 931 k ratios for the film element Pd and 913 k ratios for the various substrate elements were collected. Tests with our most recent thin‐film program, TFA, based on the double Gaussian PROZA96 procedure, on this database showed even better performance than in the previous case for the aluminium films: a mean value of 0.996 for k calc / k meas and a relative root‐mean‐square deviation of 3.266% in the histogram for the film element. Copyright © 2000 John Wiley & Sons, Ltd.