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Fluorescence‐based photoelectron features in Auger spectra
Author(s) -
Zalm P. C.,
Toussaint S. L. G.,
Crombeen J. E.
Publication year - 2000
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/1096-9918(200009)29:9<602::aid-sia905>3.0.co;2-w
Subject(s) - auger , auger electron spectroscopy , x ray photoelectron spectroscopy , photoelectric effect , spectral line , excitation , spurious relationship , fluorescence , chemistry , atomic physics , analytical chemistry (journal) , materials science , physics , optics , nuclear magnetic resonance , optoelectronics , nuclear physics , computer science , astronomy , quantum mechanics , machine learning , chromatography
The use of energetic (≥10 keV) electron beams in Auger electron spectroscopy is becoming more and more standard practice because of their superior focusability and an accompanying reduction in charging problems when inspecting thin (<1 µm) insulating layers on conductive substrates. Such beams, however, have a much greater probability to excite (x‐ray) fluorescence, which, in turn, may liberate characteristic photoelectrons. The occurrence of thus‐formed spurious peaks in Auger spectra is not generally acknowledged as a possible or probable artefact that may lead to erroneous assignments. A series of measurements has been made, mainly on silicon technology‐based materials, to establish the importance of this phenomenon. From an analysis of the data, a crude estimate of the occurrence probability and magnitude of fluorescence‐induced photoelectron excitation can be given. Copyright © 2000 John Wiley & Sons, Ltd.