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Spectromicroscopy study of an Ni+Ag/Si(111) interface
Author(s) -
Kovač J.,
Gregoratti L.,
Günther S.,
Kolmakov A.,
Marsi M.,
Kiskinova M.
Publication year - 2000
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/1096-9918(200008)30:1<479::aid-sia845>3.0.co;2-n
Subject(s) - x ray photoelectron spectroscopy , synchrotron radiation , monolayer , annealing (glass) , spectral line , synchrotron , high resolution , chemistry , analytical chemistry (journal) , crystallography , materials science , nanotechnology , optics , nuclear magnetic resonance , metallurgy , geology , physics , chromatography , astronomy , remote sensing
The influence of the surface morphology on the local interactions of a one monolayer confined Ni film with a √3‐Ag/Si(111) interface with three‐dimensional submicron‐sized Ag islands has been studied by synchrotron radiation photoelectron spectromicroscopy with a lateral resolution of 120 nm. The spatially resolved two‐dimensional maps and the photoelectron spectra measured after Ni post‐deposition at 300 K and following step annealing to 970 K give evidence for the different chemical transformation of the coexisting phases. The formation temperature and the stability of the mixed phases have been deduced and discussed. Copyright © 2000 John Wiley & Sons, Ltd.