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Study of the growth of ultrathin films of NiO on Cu(111)
Author(s) -
SánchezAgudo M.,
Yubero F.,
Fuentes G. G.,
Gutiérrez A.,
Sacchi M.,
Soriano L.,
Sanz J. M.
Publication year - 2000
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/1096-9918(200008)30:1<396::aid-sia804>3.0.co;2-3
Subject(s) - non blocking i/o , x ray photoelectron spectroscopy , evaporation , stoichiometry , monolayer , deposition (geology) , single crystal , analytical chemistry (journal) , metal , absorption spectroscopy , materials science , chemistry , crystallography , chemical engineering , nanotechnology , metallurgy , optics , catalysis , paleontology , biochemistry , physics , chromatography , sediment , biology , engineering , thermodynamics
We have studied the early stages of growth of the layers formed by Ni evaporation in an oxygen atmosphere at room temperature on a Cu(111) single crystal. The layers have been analysed by XPS and x‐ray absorption spectroscopy as a function of the deposition time. A background analysis of the XPS spectra has also been performed. We have found a Stranski–Krastanov way of growth, i.e. the formation of a metallic Ni monolayer followed by the formation of defective NiO islands. Further deposition leads to the formation of stoichiometric NiO. Copyright © 2000 John Wiley & Sons, Ltd.